Ballistic and molecular dynamics simulations of aluminum deposition in micro-trenches

نویسندگان

  • George Kokkoris
  • Pascal Brault
  • Anne-Lise Thomann
  • Amaël Caillard
  • Diane Samelor
  • Andreas G. Boudouvis
چکیده

Two different feature scale modeling frameworks are utilized for the study of aluminum (Al) deposition profiles inside micro-trenches. The first framework, which is applied in metal-organic chemical vapor deposition (MOCVD) of Al, couples a ballistic model for the local flux calculation, a surface chemistry model, and a profile evolution algorithm. The calculated conformity of the deposited film is compared with experimental results corresponding to Al MOCVD from dimethylethylamine alane (DMEAA). The outcome of the comparison is that the effective sticking coefficient of DMEAA is in the range of 0.1 – 1. There is also a strong ha l-0 08 26 50 2, v er si on 1 27 M ay 2 01 3 Author manuscript, published in ""

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تاریخ انتشار 2013